The Importance Of Masks The Importance Of Masks - Semiconductor Coatings - Cheersonic The mask is a graphic transfer tool or master in the microelectronics manufacturing process, and it is the carrier of intellectual property information such as graphic design and process technology. The function of the mask is similar to the "negative film" of a traditional camera. The production process is: 1. Using quartz glass as the [...]

Photoresist Coating Deposition Photoresist Coating Deposition - Polyimide Coating Process - Cheersonic Photoresist is mainly coated by spin coating (also known as "spin coating"). For thin resists, the best spin coating speed is 2000~4000rpm. For relatively thick resists, the best spin coating speed For 250~2000rpm, the speed of the glue machine can usually reach 9000rpm, and in some cases, a slower speed of 1000~200rpm can be used to [...]

Mask Version Mask Version - Spray Coating Photoresist - Cheersonic Also known in the industry as photomask, mask, English name MASK or PHOTOMASK), material: quartz glass, metal chrome and photosensitive glue, the product is made of quartz glass as the substrate, on which a layer of metal chrome and photosensitive Glue becomes a kind of photosensitive material. The designed circuit pattern is exposed on the photosensitive glue through [...]

Hydrophilic Coating on Microfluidic Chips Hydrophilic Coating on Microfluidic Chips - Ultrasonic Spray System - Cheersonic Application: IVD Substrate: microfluidic chips, size: from a few millimeters to 15x15cm or 20x20cm max. Thickness of the film: cover surface with a thin layer of fluid/chemical/reagent Usage: R&D stage and early prototyping stages Cover with some chemicals the surface of chip excluding the channel and the chamber The ultrasonic spray coating [...]

Wafer Cleaning Process Wafer Cleaning Process - Megasonic Cleaning Systems - Cheersonic In the chip manufacturing industry, semiconductor cleaning runs through the industry, and the steps account for more than 30% of the total production process. It is a key process that affects the quality of wafers and chip performance, with a market space of more than 40 billion. Although it is inferior to core equipment such as [...]

Ultrasonic Spray Coating System For Photoresists Ultrasonic Spray Coating System For Photoresists - Cheersonic The ultrasonic spray coating systems are proven for various applications in which uniform, repeatable coatings of photoresist or polyimide films are required. Based on below application, a. Substrate: flat, square or rectangular; thickness: 1/4’’, b. Size of substrate: width/length: typically 24’’, 30-32"; c. Liquid: photoresists d. Work requirement: 5-10 coatings in a day type [...]

Megasonic Cleaning Technology Megasonic Cleaning Technology - Ultrasonic Cleaning - Cheersonic Megasonic cleaning is developed from ultrasonic cleaning. It uses a transducer to emit megahertz-level high-energy sound waves (vibration generates 0.8 MHz), and the solution molecules are accelerated by this sound wave (the maximum instantaneous speed reaches 30 cm). /s), a cleaning technology that desorbs the adsorbed fine particles by the continuous impact of the high-speed hydrodynamic layer [...]

Introduction of Photoresist Classification Introduction of Photoresist Classification - Deposit Photoresist - Cheersonic 1. Classification by application field Photoresists are classified by application fields and can be divided into PCB photoresists, display panel photoresists, semiconductor photoresists and other photoresists. In the PCB industry: the main photoresists used are dry film photoresist, wet film photoresist, photosensitive solder resist ink, etc. The dry film is pasted on the treated copper-clad [...]

Megasonic Cleaning Systems Megasonic energy is currently a very widely used cleaning method. After adding megasonic energy, the use temperature and process time of the solution can be greatly reduced, and the cleaning effect is more effective. The commonly used frequency of megasonic cleaning is 800kHz-1 MHz, and the megasonic power is 100-600W. Compared with ultrasonic cleaning, the effect of megasonic cleaning is [...]

MSP1000 Batch Type Megasonic Plate Generally, the particle size suitable for megasonic cleaning is 0.1~0.3 μm, and the effect of megasonic cleaning is milder. CONTACT US Batch Type Megasonic Plate We specialize in providing customized solutions to meet the needs of emerging cutting-edge industries such as nanotechnology, fuel cells, semiconductors, medical coatings, spray pyrolysis and more. [...]