Measuring Oxygen Purity With Fuel Cell Sensor Measuring Oxygen Purity With Fuel Cell Sensor - Fuel Cell Coating - Cheersonic High concentrations of oxygen are used in many chemical processes to increase yields without significantly increasing costs. Oxygen enrichment for chemical processes typically ranges from 80% to 100%. Oxygen supplied to the chemical processing industry is either cryogenically generated or consumed at moderate to low levels through pressure [...]

Programmable Photoresist Spray Solution Cheersonic provides precision ultrasonic coating systems for photoresist onto MEMs wafers, using patented ultrasonic spray technology to deposit uniform thin films of photoresist onto difficult to coat deep well topographies with high aspect ratios. The soft velocity spray provides superior coverage over spin coating with repeatable performance. Cheersonic's ultrasonic coating system is a complete programmable photoresist spray solution. Our ultrasonic coating solutions are environmentally-friendly, [...]

EMI Shielding Spray Coatings EMI Shielding Spray Coatings - Spray Pyrolysis Principle - Cheersonic Spray-on silver based shielding materials have been in use for several years. Thinner, lighter device designs have made the transition from board level shielding to IC Package shielding, enabling higher board density. Ultrasonic coated EMI shielding components have comparable characteristics to sputtered parts both for adhesion and shielding properties. At a fraction of the [...]

EMI Shielding Coating System EMI Shielding Coating System Technology applies a thin, uniform conformal coating of advanced EMI shield materials from all major suppliers. When properly applied, these new formulations provide equivalent performance and reliability compared to traditional sputtering techniques. Features & Benefits Complete thin film coverage of geometries with excellent uniformity Top surface to sidewall thickness ratio of: 1.0 to ~0.6-0.7 High through put Excellent surface conductivity [...]

Depositing Photoresist Onto MEMS Cheersonic has extensive application expertise in depositing photoresist onto MEMS and other semiconductor wafer substrates. Ultrasonic spray coating systems are proven for various applications in which uniform, repeatable coatings of photoresist or polyimide films are required. Our coating solutions are environmentally-friendly, efficient and highly reliable, and enable dramatic reductions in overspray, savings in raw material, water and energy usage and provide improved process repeatability, [...]

PEM Water Electrolysis Hydrogen Production Technology PEM Water Electrolysis Hydrogen Production Technology - Cheersonic PEM water electrolyzer adopts PEM to conduct protons, isolate the gas on both sides of the electrode, and avoid the shortcomings associated with AWE using strong alkaline liquid electrolyte. PEM water electrolyzer uses PEM as electrolyte and pure water as reactant. In addition, the hydrogen permeability of PEM is low, so the purity of [...]

Photoresist Ultrasonic Coating System The new photoresist ultrasonic coating system has been designed specifically to meet the unique challenges of coating high aspect ratios and deep well topographies such as MEMS wafers with photoresist. Cheersonic has extensive application expertise in depositing photoresist onto MEMS and other semiconductor wafer substrates. The ultrasonic coating system replaces traditional spin coating equipment, providing more uniform coverage of side walls in difficult to [...]

Deposition of Thin Photoresist Films Ultrasonic Coating Deposition of Thin Photoresist Films - Cheersonic The new UAM6000 system is a full coating solution, configured with ultrasonic spray shaping nozzles, depending upon coating requirements. These nozzles feature up to 90% reduction in material consumption, non-clogging performance, precise control of droplet size, and repeatable spray patterns at ultra-low flow rates. UAM6000 unique system features include: · Automated spray coating with [...]

Ultrasonic Coating System for Photoresist Deposition Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Cheersonic ultrasonic atomization equipment has been used to apply photoresist film coatings on semiconductor wafers. As high-aspect-ratio MEMS and sensor manufacturing continues to expand, Cheersonic has developed a suite of photoresist thin film coatings that overcome the challenges of uniformly covering photoresist onto wafers with deep trenches or difficult topography. The UAM6000 was [...]

Development of Mask Development of Mask - Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Photolithography technology is a core step in semiconductor device manufacturing process, and lithography machine is also known as mask alignment exposure machine. This is because the commonly used lithography machine is mask alignment lithography. The optical lithography technology has roughly gone through three stages so far, and the mask plays an important [...]