Photoresist Deposition

Photoresist Deposition – Spray Coating – Cheersonic

Cheersonic ultrasonic nozzles are proven successful for dispensing photolithographic chemicals onto semiconductor wafers and flat panel displays. It is ideal for photoresist processes where high precision is required. Cheersonic remains at the forefront of emerging electronics applications, offering precision thin film coating systems for new technologies such as advanced batteries, ultracapaciters, nanowires, carbon nanotubes and OLED flat panel displays.

Benefits of ultrasonic spray for photoresist include:
• Uniform coverage inside deep well topographies such as MEMs.
• Reduction in photoresist consumption.
• Tight deposition density control.
• High transfer efficiency