PEM Water Electrolysis Hydrogen Production Technology PEM Water Electrolysis Hydrogen Production Technology - Cheersonic PEM water electrolyzer adopts PEM to conduct protons, isolate the gas on both sides of the electrode, and avoid the shortcomings associated with AWE using strong alkaline liquid electrolyte. PEM water electrolyzer uses PEM as electrolyte and pure water as reactant. In addition, the hydrogen permeability of PEM is low, so the purity of [...]

Photoresist Ultrasonic Coating System The new photoresist ultrasonic coating system has been designed specifically to meet the unique challenges of coating high aspect ratios and deep well topographies such as MEMS wafers with photoresist. Cheersonic has extensive application expertise in depositing photoresist onto MEMS and other semiconductor wafer substrates. The ultrasonic coating system replaces traditional spin coating equipment, providing more uniform coverage of side walls in difficult to [...]

Deposition of Thin Photoresist Films Ultrasonic Coating Deposition of Thin Photoresist Films - Cheersonic The new UAM6000 system is a full coating solution, configured with ultrasonic spray shaping nozzles, depending upon coating requirements. These nozzles feature up to 90% reduction in material consumption, non-clogging performance, precise control of droplet size, and repeatable spray patterns at ultra-low flow rates. UAM6000 unique system features include: · Automated spray coating with [...]

Ultrasonic Coating System for Photoresist Deposition Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Cheersonic ultrasonic atomization equipment has been used to apply photoresist film coatings on semiconductor wafers. As high-aspect-ratio MEMS and sensor manufacturing continues to expand, Cheersonic has developed a suite of photoresist thin film coatings that overcome the challenges of uniformly covering photoresist onto wafers with deep trenches or difficult topography. The UAM6000 was [...]

Development of Mask Development of Mask - Ultrasonic Coating System for Photoresist Deposition Offers Unique Advantages Photolithography technology is a core step in semiconductor device manufacturing process, and lithography machine is also known as mask alignment exposure machine. This is because the commonly used lithography machine is mask alignment lithography. The optical lithography technology has roughly gone through three stages so far, and the mask plays an important [...]

Fully Automate Reciprocating Ultrasonic Spray Fluxing System UAM8000 is a fully automate reciprocating ultrasonic spray fluxing system that is designed for spraying water soluble/organic acid fluxes. All of the materials are constructed with materials that are proven compatible with these very corrosive fluxes. This versatile system is easily integrated with all major wave solder machines. The flexibility of selective area fluxing or full board width coverage combined with [...]

Spray Coating Photoresist On Silicon Wafers Spray Coating Photoresist On Silicon Wafers - Ultrasonic Photoresist Coater - Cheersonic Spin coating of photoresist, although an established technique for resist depositionis often not suitable for applications with high topography on the silicon or glasssurface. Since 3D structures such as trenches, V-grooves and holes are basic elementsin building the required functionality of MEMS devices, spin coating usually causesdefects on the resist [...]

Spray Anti-reflective Coating Spray Anti-reflective Coating Using Cheersonic Ultrasonic Spray Systems For future curved display glasses for automotive interior applications, in addition to an anti-glare surface and a hydrophobic coating, a high-quality anti-reflective coating is increasingly required. The three-dimensional surface of the display glasses places very high demands on the coating technology. Antireflective coatings applied by ultrasonic spray technology could be an interesting alternative for us to the [...]

Photoresist Coating Process Photoresist Coating Process - Photoresist Deposition - Cheersonic The photoresist needs to form a uniform film on the surface of the wafer, and the photoresist is coated on the wafer by the coating equipment under high-speed rotation. The thickness of the photoresist can be adjusted according to the rotational speed and the viscosity of the photoresist. The higher the rotational speed, the thinner the film, [...]

Megasonic Cleaning Applications Megasonic Cleaning Applications - Semiconductor Cleaning - Cheersonic Megasonic cleaning technology, as a nano-scale cleaning technology represented by ultra-precision cleaning, plays a pivotal role in the field of semiconductor cleaning, and has become a promising dark horse in the field of cutting-edge precision cleaning: it can not only complete Si wafers, GaAs, liquid crystal glass and other The cleaning of the glass mask can also [...]