Benchtop Spray Coating System For Photoresist Coating

We have a benchtop spray coating system for photoresist coating on 300mm x 300mm area. We have much experience in spraying photoresist, the substrate can be silicon wafers, glass, ceramic, and metal and have made a great amount of trial.

There is a nozzle specially designed for spraying the substrate with deep trench or cavity pattern. I attached the picture and Youtube links of spraying photoresist on silicon wafer with deep trench.

For the substrate thickness of 400um, it needs to be customized with a 4inches heating and vacuum plate. The size and shape are same with SOI wafer to avoid excess photoresist penetrates into the back of the SOI wafer.

The most important is the substrate must be level, non-levelness will cause unevenness in the film. Then for the uniform and controllable coating thickness, it requires higher coating process. There is upgraded cleaning room which can do the high standard test experiments. You are welcome to send the sample materials for free test.