Ultrasonic Spraying of Photoresist onto Stainless Steel Square Wafers

Ultrasonic Spraying of Photoresist onto Stainless Steel Square Wafers. Ultrasonic spraying of photoresist is an advanced microelectronics manufacturing technology that can improve coating quality and efficiency.

Ultrasonic spray coating technology can complete the coating process in a shorter time than traditional brushing or roller coating methods, which is very important for high-resolution photoresist coating. Photoresist is an important material in the wafer manufacturing process. It is a photosensitive material whose solubility changes under the irradiation of light. The pattern on the mask can be transferred to the mask through a series of steps such as exposure, development and etching. on the substrate. The application of ultrasonic spray technology can avoid uneven flow or coating distortion on the coating surface, which is particularly important for some materials that are sensitive to the surface of the object.

In addition, ultrasonic spray technology can improve the thickness and uniformity of the coating to better protect the surface of the object. Not only that, ultrasonic spray technology can also be applied to various types of goods, including documents, commodities and samples. With the rapid development of microelectronics manufacturing technology, the application prospects of ultrasonic spray technology are very broad.

About Cheersonic

Cheersonic is the leading developer and manufacturer of ultrasonic coating systems for applying precise, thin film coatings to protect, strengthen or smooth surfaces on parts and components for the microelectronics/electronics, alternative energy, medical and industrial markets, including specialized glass applications in construction and automotive.

Our coating solutions are environmentally-friendly, efficient and highly reliable, and enable dramatic reductions in overspray, savings in raw material, water and energy usage and provide improved process repeatability, transfer efficiency, high uniformity and reduced emissions.

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