Spray Coater for Photoresists

Spray Coater for Photoresists – Ultrasonic Atomisation – Cheersonic

In the context of spray coating technology, the formation of the resist film is a meticulously orchestrated process. The resist film is deposited using atomised photoresist, wherein the typical droplet sizes fall within the micrometer range. These droplets, which are crucial building blocks for the film, come into being through various means. For instance, ultrasonic atomisation is commonly employed. Ultrasonic waves are directed at the photoresist solution, causing it to break up into tiny droplets. Subsequently, these droplets, carried by a gentle stream of air or nitrogen, travel towards the substrate surface. As they land on the substrate, they coalesce and interconnect, gradually building up to form a continuous and closed resist film, which is vital for subsequent microfabrication steps. This process is widely utilized in industries like microelectronics manufacturing, where precision and uniformity are of the utmost importance.

About Cheersonic

Cheersonic is the leading developer and manufacturer of ultrasonic coating systems for applying precise, thin film coatings to protect, strengthen or smooth surfaces on parts and components for the microelectronics/electronics, alternative energy, medical and industrial markets, including specialized glass applications in construction and automotive.

Our coating solutions are environmentally-friendly, efficient and highly reliable, and enable dramatic reductions in overspray, savings in raw material, water and energy usage and provide improved process repeatability, transfer efficiency, high uniformity and reduced emissions.

Chinese Website: Cheersonic Provides Professional Coating Solutions