Photoresist Coating Techniques Ultrasonic Photoresist Coating Techniques utilize high-frequency vibrations to enhance photoresist uniformity and adhesion during semiconductor manufacturing. This advanced method ensures precise thin-film deposition, reduces defects, and improves process efficiency for microelectronic device fabrication. Through the utilization of ultrasonic atomization technology, the photoresist, which is laden with an adequate amount of solvent, is fragmented and transformed into minuscule droplets, typically in the micrometer scale. These atomized [...]

Spray Coating of Photoresists Spray Coating of Photoresists, a highly sophisticated and versatile technique in the realm of thin film deposition, refers to the intricate process of creating a resist film. It involves the propulsion of millions of minute resist droplets, each typically sized in the micrometer range, towards the substrate. These droplets, akin to a microscopic army, travel through the air or gas medium, converging to form [...]

Ultrasonic Spraying FOP Glass Family members, in the glass processing industry, the application of FOP glass is becoming more and more widespread, but its spraying process has always been a headache. The traditional spraying method either has uneven coating thickness, resulting in inconsistent glass transmittance, affecting product quality; or the spraying efficiency is low, wasting a lot of time and materials, and the cost remains high. Today, I [...]