Fitted Megasonic Cleaning System
We specialize in providing customized solutions to meet the needs of emerging cutting-edge industries such as nanotechnology, fuel cells, semiconductors, medical coatings, spray pyrolysis and more.
Fitted megasonic cleaning system Megasonic cleaning technology not only preserves the advantages of ultrasonic cleaning technology, but also overcomes some of its shortcomings. The mechanism of megasonic cleaning technology is the chemical reaction of chemical cleaning agents combined with high-frequency vibration slices for cleaning. So far, the megasonic cleaning method has become the most widely used and effective method in polishing wafer cleaning. Generally, the particle size suitable for removal by megasonic cleaning is 0.1~0.3 μm, and the particle size suitable for removal by ultrasonic cleaning is above 0.4 μm. The effect of megasonic cleaning is gentler. Therefore, an appropriate vibration frequency should be selected according to the size of the particles to be removed and the impact force that the device on the wafer surface can withstand.
- CMP chemical mechanical polishing
- Cleaning before bonding
- Mask cleaning
- Development
- Lift-off Metal Stripping
- Wet etching
- Lens cleaning
- Precision cleaning in the microelectronics industry such as display screens
- Silicon
- GaAs
- Indium Phosphide
- Gallium Nitride
- Silicon carbide
- Lithium Niobate
- Lithium tantalate, etc.
PERFECTING YOUR PROCESS
Features
• Reduced cleaning difficulty
• Increased cleaning efficiency
• Can work in multiple areas, compatible with 8″ and 12″
• Reduced chemical consumption
• No chemical pollution is generated
• No damage to the substrate surface
• Control the thickness of silicon and oxide layers
• No risk of conductive material falling off
Basic Specifications
• Megasonic frequency 1MHz
• Power density <2W/cm2
• Housing material PEEK
• Vibrator Material Quartz or Sapphire
• Cooling air flow 10L/min
• Liquid flow 0.5-3.0 L/min
• Applicable wafers 4″, 6″, 8″, 12″
• Liquid temperature <70°C
• Ambient temperature 10-40°C
OUR EXPERTISES
Cheersonic offers innovative and customized solutions that will meet your needs. Discover how our expertise, combined to yours, can speed up your production.
To reach our anytime via email please fill out the form below with your request and a company representative will reply to you. To find your local CHEERSONIC representative to connect directly click your region in the contact drop down menu.
Contact CHEERSONIC For immediate assistance please contact us the corporate headquarters during business hours at 6:00 am – 22:00 pm.
Tel: 0571-87910406
- Mobile: +86 13588732518
- Email: Market2@cheersonic.com
Add: 11-13 Chuangye Road, Changkou, Fuyang, Hangzhou, Zhejiang, China