Spray Coater for Photoresists Spray Coater for Photoresists - Ultrasonic Atomisation - Cheersonic In the context of spray coating technology, the formation of the resist film is a meticulously orchestrated process. The resist film is deposited using atomised photoresist, wherein the typical droplet sizes fall within the micrometer range. These droplets, which are crucial building blocks for the film, come into being through various means. For instance, ultrasonic [...]

Photoresist Coating Systems of Positive Photoresist Photoresist Coating Systems of Positive Photoresist - Cheersonic Our state-of-the-art ultrasonic photoresist coating systems have been meticulously engineered to offer a highly precise and efficient solution for microfabrication processes. Specifically, these advanced systems are capable of depositing a uniformly thin layer, ranging from 5 to 7 micrometers, of positive photoresist, with the renowned AZ resist being our material of choice. When it [...]

Photo Resist Coater The state-of-the-art Photo Resist Coater we've developed represents a significant breakthrough in coating technology. It is specifically engineered to cater to non wafer and non semiconductor processing, thereby broadening its application scope beyond the traditional semiconductor realm. This innovative device showcases remarkable versatility, as it can effortlessly handle substrates of diverse sizes. Whether it's small, intricate components for microelectronics peripherals or larger substrates used in [...]