Photoresist Coating Process
Photoresist Coating Process Photoresist Coating Process - Photoresist Deposition - Cheersonic The photoresist needs to form a uniform film on the surface of the wafer, and the photoresist is coated on the wafer by the coating equipment under high-speed rotation. The thickness of the photoresist can be adjusted according to the rotational speed and the viscosity of the photoresist. The higher the rotational speed, the thinner the film, [...]

