Ultrasonic Spray for Photoresist
Ultrasonic Spray for Photoresist There are a large variety of substrates that require the application of photoresist where conventional spin coating methods do not produce a uniform layer. The types of substrates include: wafers with various degrees of topography and micro vias, small glass lenses used for wearable devices, noncircular substrates, large panels, etc. The traditional spin coating method is often ineffective in applying a thin, uniform layer [...]

