Understanding Photoresist in One Article Understanding Photoresist in One Article - Photoresist Coating‎ - Cheersonic In semiconductor manufacturing processes, since complex microstructures often need to be prepared, the requirements for each photolithography may be very different. Sometimes positive photoresist is needed to improve resolution, sometimes negative photoresist is needed for lift-off, and sometimes thick photoresist is needed for deep trench etching. So how do they meet these requirements? [...]

Ultrasonic Spraying of Glass Substrate In the field of modern material processing, glass substrates, as a key basic material, are widely used in many high-tech industries such as display and optics. The emergence of ultrasonic spraying technology has brought revolutionary changes to the processing and modification of glass substrates, and opened a new chapter in the application of glass substrates. 1. The magical principle of ultrasonic spraying technology [...]

Ultrasonic Polyimide and Photoresist Coatings Ultrasonic Polyimide and Photoresist Coatings - Polyimide Coating - Cheersonic Polyimide and photoresist coatings have found a wide array of common applications that span across multiple technological and industrial sectors. These applications are not only diverse but also highly crucial in the development and functionality of various modern devices. They include, but are by no means restricted to, the field of MEMS (Micro-Electro-Mechanical [...]

Create Nanometric Thin Films of Graphene Create Nanometric Thin Films of Graphene - Ultrasonic Atomizers - Cheersonic In today's technology-driven era, economical ultrasonic coating equipment has emerged as a vital tool. Specifically, it plays a crucial role in fabricating nanometric thin films of graphene onto Cu foil. This process is not only cost-effective but also highly precise. By leveraging ultrasonic waves, the equipment can evenly disperse and deposit [...]

Polyimide diaphragm modification technology Polyimide diaphragm modification technology - Polyimide Coatings - Cheersonic PI nanofiber membrane prepared by electrospinning technology has high porosity and good electrolyte wettability. However, high porosity will also reduce the mechanical properties of the diaphragm, which will put pressure on the assembly and use of the battery. On the other hand, the large pore size of the PI nanofiber membrane also brings about the [...]

Preparation of Polyimide Diaphragm 1. Why can polyimide be used as a raw material for lithium battery diaphragm? First, PI material has outstanding high temperature resistance, and the long-term use temperature can reach 300℃, which gives the diaphragm good thermal dimensional stability and improves the safety of high temperature use of the battery; Secondly, the PI molecular structure contains abundant polar groups, and the electrolyte wettability is better, [...]

Ultrasonic Coating Polyimide Ultrasonic Coating Polyimide - Polyimide Coating - Cheersonic Polyimide and photoresist coatings are widely used across various industries due to their unique properties, making them essential in numerous applications. Some of the most common applications include Micro-Electro-Mechanical Systems (MEMS), lenses, microfluidic devices, microelectronics, and filters, but their utility extends far beyond these examples. In MEMS, polyimide and photoresist coatings are crucial for providing a reliable [...]

Ultrasonic Spray Water-based Coating Solution Ultrasonic Spray Water-based Coating Solution - Cheersonic The maximum spraying area of the UAM4000L can reach an impressive dimension of 400×400mm, allowing it to efficiently cover a substantial surface area. Furthermore, it possesses the capability to spray coating thicknesses of less than 50 micrometers (um), ensuring precision and uniformity in the application process. This versatile machine can be utilized to spray a wide [...]

The Difference Between Positive and Negative Photoresist I think many people may have heard that the old metal body cameras (silver salt photos) have terms such as negative film and positive film. The photoresists used in photolithography also have negative and positive. Negative photoresist will leave a pattern where the light is irradiated, while positive photoresist will leave a pattern where the light is not irradiated. Therefore, for [...]

PSPI PSPI (photosensitive polyimide) is a very important semiconductor material, and also a very bottleneck material. What is PSPI? PSPI, the full name of which is "photosensitive polyimide", combines the excellent physical and chemical properties of polyimide (PI) with the characteristics of photosensitive materials. PSPI is similar to photoresist. Under the radiation of ultraviolet light, α rays, X-rays, etc., the structure of the irradiated part will change, and [...]