Exposure Mechanism of Positive Photoresist
Exposure Mechanism of Positive Photoresist Exposure Mechanism of Positive Photoresist - Photoresist Coatings - Cheersonic Photoresist is mainly composed of photosensitive agent, resin, solvent, additives (plasticizer, surfactant, photosensitizer, etc.). Resin is the basic skeleton of photoresist and is insensitive to light. Solvents mainly include PGMEA, EGMEAD, etc., which are used to dilute photoresist and adjust its viscosity. Photosensitive agent mainly undergoes photochemical reaction to light energy. Exposure principle [...]