Photoresist Spray System
Photoresist Spray System Ultrasonic Photoresist Spray System is uniquely suite to photoresist deposition onto MEMs with high aspect ratios, providing more uniform coatings than conventional spin process. Wafer sizes range from 50mm diameter to 300mm diameter. Coating thicknesses range from 0.5 microns to 10 microns. Coating thickness and uniformity can be certified at the customers request. About Cheersonic Cheersonic is the leading developer and manufacturer of ultrasonic coating systems for applying [...]

