Megasonic Cleaning for Semiconductors Megasonic Cleaning for Semiconductors - Megasonic Cleaning - Cheersonic Spray megasonic cleaning is an efficient cleaning method that can remove nanoparticle contaminants on the wafer surface. Megasonic cleaning uses megahertz-level ultrasonic energy to drive the removal of sub-micron particles and chemical reactions on the surface of substrates. Compared with the low-frequency ultrasonic cavitation effect, the megasonic cavitation effect can remove smaller particles and significantly [...]

Polyimide Ultrasonic Spray Coating Polyimide Ultrasonic Spray Coating System shows higher performance and effect in the application of polyimide coating. As a high-performance organic polymer material, polyimide has excellent properties, such as high temperature resistance, low temperature resistance, corrosion resistance, etc. It has been widely used in various fields. For example, polyimide coating in micro-electromechanical systems can act as a lubricant and improve the stability and reliability of [...]

Ultrasonic Coater for Spraying Photoresist Ultrasonic Coater for Spraying Photoresist. Ultrasonic coating machine, this black technology, will bring revolutionary changes to photoresist spraying! Ultrasonic spray coating is a simple, economical and repeatable process for photoresist and polyimide coatings. Ultrasonic coating systems enable fine control of flow, coating speed and deposit volume using simple layering techniques. Ultrasonic spray technology is used for semiconductor photoresist coatings. Compared with the traditional [...]